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Plasma Surface Engineering

Plasma Surface Engineering
Overview

The Plasma Surface Engineering Division (PSED) at the Institute for Plasma Research (IPR) is actively engaged in the development of plasma-based surface modification techniques to address diverse scientific and industrial needs. The major research areas of PSED are focused on plasma-material interactions through processes such as plasma immersion ion implantation, plasma carburizing and plasma nitriding, along with precision-driven development of single and multi-layer thin film coatings using planar and cylindrical magnetron sputtering. Additionally, PSED is equipped with low-energy Kaufman-type ion beam facilities, where R&D activities are carried out to create a variety of surface textures on desired material surfaces.

Beyond surface modifications, the division also explores energy-efficient alternatives for hydrogen generation by the development of a lab-scale plasma electrolyzer system. In addition, PSED extends its research focus on the utility of plasma in the ambient environment by developing atmospheric pressure plasma jets for biomedical applications.

The activities undertaken by PSED are summarized below:

• Plasma Immersion Ion Implantation (PIII).

• Plasma Carburizing for Enhanced Surface Hardness.

• Development of Plasma Based Coatings Using Planar and Cylindrical Magnetron Sputtering.

• Low Energy Ion Beam Facility for Fusion and Industrial Applications.

• Development of Plasma Electrolyzer System for Hydrogen Production.

• Development of Atmospheric Pressure Plasma Jets (APPJs) and their applications.

Plasma Surface Engineering
Experiments

1.Plasma Immersion Ion Implantation. 

Plasma Immersion Ion Implantation (PIII) is an advanced surface engineering technique that enhances the physical, chemical, and mechanical properties of materials by implanting ions into their surfaces. Applications include improved hardness, wear and corrosion resistance, biocompatibility, thin-film adhesion, and semiconductor device performance. IPR has developed a low-energy (up to 20 keV) prototype PIII system equipped with a 1000 W RF plasma source and a high-voltage pulsed DC power supply (20 kV, 1 A). The facility can be used for implanting gaseous ions for engineering material surfaces. It can also be used for simulating important aspects of low energy (20 keV max.) plasma-material interactions in fusion plasma environment. System has been demonstrated for nitrogen implantation into Aluminium (Al) samples.


2.Plasma Carburizing for Enhanced Surface Hardness.

Plasma carburizing is a vacuum-based surface hardening process that enhances the hardness, wear resistance, and fatigue strength of steels by diffusing carbon into the surface. Compared to conventional carburizing, it provides uniform carburization, faster processing, and eliminates internal oxidation. It is widely used for automotive, aerospace, and tooling components such as gears, shafts, bearings, and dies. IPR has recently developed an industrial-scale plasma carburizing system with gas-based quenching, capable of processing 500 kg loads. Using acetylene as carburizing gas, the system ensures uniform carburization with minimal soot formation. This system will then be run in a jobshop mode to cater to the needs of the industries. .


3.Development of plasma-based coatings using planar and cylindrical magnetron sputtering.

Sputtering based coatings are atomistic deposition processes which are operated at relatively low temperature. PSED division has developed magnetron sputtering systems which are used to perform coatings of different metals (Cu, Al, Zn, Ti, Cr, Ag, Mo, W etc.) as well as compounds (TiN, TiAlN, ZnO, CuO etc). The magnetron configurations like circular, rectangular, cylindrical are used for coating different types of substrates. These coatings are being designed for a range of applications, including antibacterial coatings, hard coatings, and corrosion-resistant coatings. Additionally, experiments are underway to develop a few microns thick tungsten-based coatings, which can endure high heat flux and erosion in the plasma-facing components of fusion reactors.


4.Multi-layer Thin Film Deposition using Magnetron Sputtering Technique.

The Lab specializes in advanced multi-layer thin film depositions using a multi-chamber multi-magnetron (MCMM) sputtering system to engineer high-precision single and multi-elemental layers, which enables the fabrication of complex multilayer thin film structures essential for next-generation technologies. The research spans diverse, critical applications, including photovoltaic (PV) devices, high-temperature superconducting (HTS) tapes, and multilayer mirrors (MLM) for X-ray spectrometer etc. Having successfully developed key layers for solar PV devices, the current research focuses on design and deposition of high-reflectivity MLM coatings for soft X-rays. Through state-of-the-art deposition techniques, the lab continues to bridge the gap between material science innovation and practical engineering solutions.


5.Plasma Material Interaction Studies for fusion to industrial applications .

Plasma–material interaction studies are being conducted for surface modification of a wide range of materials from fusion-relevant, space and for industrial applications. For this purpose, two low-energy Kaufman-type ion beam facilities are established, which can generate ion beams with energies ranging from 50 eV to 1500 eV with Ar and Xe ions. These ion beams are used to create diverse surface textures such as ripple patterns, dots, and facets on substrates including silicon, glass, GaSb, polymers, graphite, ceramic and others. The modified substrates have applications in molecular sensing, surface wettability control, reflectivity tuning, erosion rate studies, sensing and magnetic property enhancement. In addition, plasma material interaction (PMI) lab is equipped with an RF plasma and a fireball-based DC plasma etching system for tailoring the surface wettability of various materials along with magnetron sputtering based PVD coaters. These systems can also be utilized for depositing metallic and non-metallic coatings on substrates of interest.


6. Development of Plasma Electrolyzer System for Hydrogen Production .

This research focuses on plasma electrolysis process and the development of a plasma electrolyzer system for efficient hydrogen production. The work explores the fundamental physics of plasma–liquid interactions and plasma-assisted electrochemical processes to enhance hydrogen generation under energy-efficient operating conditions. Emphasis is placed on understanding charge transfer mechanisms, reactive species formation, and interfacial plasma dynamics in electrolyte systems. The research also involves the design and engineering of electrocatalysts and electrode architectures to improve catalytic activity, stability, and hydrogen evolution efficiency. This integrated approach contributes to the development of clean-energy technologies for next-generation green hydrogen production systems.


7.Development of Atmospheric Pressure Plasma Jets (APPJs) and their applications.

Atmospheric pressure non-thermal (i.e., cold) plasmas especially plasma jets are widely studied in plasma medicine and used for various therapeutic applications. These cold plasmas for tumor treatment or for skin infection etc. is promising and emerging field. IPR has indigenously developed atmospheric pressure plasma Jet (APPJ) for bio-medical applications. On the R&D level, APPJs are being studied for the treatment of cancer tissues and cells such as oral, gliomas, lung cancer etc. along with wound healing applications. In parallel, APPJs are also investigated in dental care applications. Apart from this, the APPJs are also being explored for other application like sterilization, cleaning of the surfaces etc. Additionally, the development of arrays of APPJs is being pursued for large area surface treatment.

Division Head

Dr. Alphonsa Joseph Palakel

Dr. Alphonsa Joseph Palakel

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SO-H
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Team Members

Dr. Suryakant B. Gupta

Dr. Suryakant B. Gupta

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SOH
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Dr. Mukesh Ranjan

Dr. Mukesh Ranjan

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Scientific Officer – G
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Dr. Ramkrishna Rane

Dr. Ramkrishna Rane

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Scientific Officer – G
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Akshay Vaid

Akshay Vaid

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Scientific Officer – F
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Anand H. Visani

Anand H. Visani

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Scientific Officer – F
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Dr. Sagar Agrawal

Dr. Sagar Agrawal

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Scientific Officer – E
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Satyaprasad A.

Satyaprasad A.

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Scientific Officer – E
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Keena Kalaria

Keena Kalaria

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Scientific Officer – E
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Sooraj K P

Sooraj K P

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Scientific Officer – E
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Dr. Amreen Ara Hussain

Dr. Amreen Ara Hussain

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Scientific Officer – E
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Ghanshyamsinh Jhala

Ghanshyamsinh Jhala

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Scientific Officer – D
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Naresh Kumar P. Vaghela

Naresh Kumar P. Vaghela

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Scientific Officer – D
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Subham Tiwari

Subham Tiwari

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Technical Officer – C
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Rohit Parihar

Rohit Parihar

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Scientific Assistant – C
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Maila Paramesh

Maila Paramesh

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Scientific Assistant – C
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Vijay Chauhan

Vijay Chauhan

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Technician – H
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Last Updated: 27-Aug-2026 01:34 PM